According to Zhang Taile, vice president of products in Membalze, data center SSD refers to data center demand represented by Internet enterprises, and its typical application is characterized by distributed application, while traditional industries and enterprise users depend on centralized application. Focus and demands are different in various applications. Openness defeats closure! Zhang belie...

This part introduces the evolution of photoresist from exposure source to film-forming material in detail. As time goes by, four types of photoresist have been developed by shrinking the line width of integrated circuits and continuously improving resolution, in order to meet various requirements.

With rising 96-layer 3D flash memory capacity in the second quarter, NAND flash memory market will come into a severe over supply stage.

This article introduces various formats for best SSDs. These products are form some leading suppliers, including Intel, Western Digital, Samsung, Toshiba, Seagate and Micron.

Today, there are several storage products such as 3D XPoint, QLC SSD, Open Channel SSD and customized SSD in data center. What types of products will become mainstream SSD in the future? This article discusses their features, cost, advantages and applications in detail. With comprehensive comparison, the author thinks customized NVMe SSD will be the mainstream in the next five years.

This article mainly tells us about basic components of photoresist, including polymer, solvent, photosensitive agent and additive. Photoresist can be divided into two types: positive photoresist and negative photoresist. Both of them have different features and application, and when choosing proper photoresist, you need to consider the resolution, aspect ratio, exposure speed and so on.

ASML, the leader in the field of lithography machine, monopolizes the high-end lithography machine market. As the technical threshold of the lithography machine is extremely high, few companies have the ability to produce high-end lithography machines. Therefore, it’s no wonder one EUV lithography machine is about $100 million, equivalent to F35, the fourth generation fighter of American Empire.

The technology of EUV is difficult to promote and its research and development requires a large of investment. Although speeding up EUV research and development means doubling expenditure, TSMC, Intel and Samsung are still willing to cooperate with ASML to speed up the development of EUV.

This article briefly introduces several reasons for the depression of Nikon and Canon and shows the structure and working principle of ASML lithography machine.

Photoresist is an etching-resistant film material whose solubility changes through irradiation or radiation of different light sources. As the core of lithography, photoresist play an important role in micro-fabrication technology. However, it’s hard to make breakthrough of research and development in photoresist.